Description
The Mono polishing pads are part of the Mono system. The specially designed pad maintains its original hardness longer than conventional polishing pads. As old wax residues in the pad increase the risk of holograms, the foam is as thin as possible (12 mm/20 mm). This allows for easy and complete cleaning in water as well as a more sensitive pressure application.
Mono polishing pads are equipped with a soft working edge, protective Velcro and open-pored special foam. The polishing pad with a central hole is for orbital/dual action polishing machines. Suitable for scratch-resistant cloth.
Grind 9/10
Gloss level 10/10.
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